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Silicides for 65nm CMOS and beyond

dc.contributor.authorKittl, Jorge
dc.contributor.authorLauwers, Anne
dc.contributor.authorChamirian, Oxana
dc.contributor.authorVan Dal, Mark
dc.contributor.authorAkheyar, Amal
dc.contributor.authorRichard, Olivier
dc.contributor.authorLisoni, Judit
dc.contributor.authorde Potter de ten Broeck, Muriel
dc.contributor.authorLindsay, Richard
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T05:11:21Z
dc.date.available2021-10-15T05:11:21Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7741
dc.sourceIIOimport
dc.titleSilicides for 65nm CMOS and beyond
dc.typeProceedings paper
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorde Potter de ten Broeck, Muriel
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.beginpage267
dc.source.endpage278
dc.source.conferenceCMOS Front-End Materials and Process Technology
dc.source.conferencedate21/04/2003
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 765


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