Show simple item record

Cleaning of metal gate stacks for the sub 90nm technology node

dc.contributor.authorKraus, Harald
dc.contributor.authorVermeyen, Kenneth
dc.contributor.authorSnow, Jim
dc.contributor.authorFyen, Wim
dc.contributor.authorMertens, Paul
dc.contributor.authorKovacs, Frederic
dc.date.accessioned2021-10-15T05:14:10Z
dc.date.available2021-10-15T05:14:10Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7756
dc.sourceIIOimport
dc.titleCleaning of metal gate stacks for the sub 90nm technology node
dc.typeMeeting abstract
dc.contributor.imecauthorMertens, Paul
dc.source.peerreviewno
dc.source.conference204th Meeting of the Electrochemical Society: 8th Int. Symp. on CLeaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate12/10/2003
dc.source.conferencelocationOrlando, FL USA
imec.availabilityPublished - imec
imec.internalnotesAbstract 816


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record