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Surface modification of porous low-k dielectrics

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorStruyf, Herbert
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorConard, Thierry
dc.contributor.authorBoullart, Werner
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T05:20:29Z
dc.date.available2021-10-15T05:20:29Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7788
dc.sourceIIOimport
dc.titleSurface modification of porous low-k dielectrics
dc.typeProceedings paper
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.source.peerreviewno
dc.source.beginpage206
dc.source.endpage215
dc.source.conferenceThin Film Materials, Processes and Reliability
dc.source.conferencedate29/04/2003
dc.source.conferencelocationParis France
imec.availabilityPublished - imec
imec.internalnotesElectrochemical Society Proceedings; Vol. 2003-13


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