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A comparison of spike, flash, SPER and laser annealing for 45nm CMOS

dc.contributor.authorLindsay, Richard
dc.contributor.authorPawlak, Bartek
dc.contributor.authorKittl, Jorge
dc.contributor.authorHenson, Kirklen
dc.contributor.authorTorregiani, Cristina
dc.contributor.authorGiangrandi, Simone
dc.contributor.authorSurdeanu, Radu
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorMayur, A.
dc.contributor.authorRoss, J.
dc.contributor.authorMcCoy, S.
dc.contributor.authorGelpey, J.
dc.contributor.authorElliott, K.
dc.contributor.authorPagès, Xavier
dc.contributor.authorSatta, Alessandra
dc.contributor.authorLauwers, Anne
dc.contributor.authorStolk, P.
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T05:24:27Z
dc.date.available2021-10-15T05:24:27Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7807
dc.sourceIIOimport
dc.titleA comparison of spike, flash, SPER and laser annealing for 45nm CMOS
dc.typeProceedings paper
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage261
dc.source.endpage266
dc.source.conferenceCMOS Front-End Materials and Process Technology
dc.source.conferencedate21/04/2003
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 765


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