dc.contributor.author | Lindsay, Richard | |
dc.contributor.author | Pawlak, Bartek | |
dc.contributor.author | Kittl, Jorge | |
dc.contributor.author | Henson, Kirklen | |
dc.contributor.author | Torregiani, Cristina | |
dc.contributor.author | Giangrandi, Simone | |
dc.contributor.author | Surdeanu, Radu | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.contributor.author | Mayur, A. | |
dc.contributor.author | Ross, J. | |
dc.contributor.author | McCoy, S. | |
dc.contributor.author | Gelpey, J. | |
dc.contributor.author | Elliott, K. | |
dc.contributor.author | Pagès, Xavier | |
dc.contributor.author | Satta, Alessandra | |
dc.contributor.author | Lauwers, Anne | |
dc.contributor.author | Stolk, P. | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-15T05:24:27Z | |
dc.date.available | 2021-10-15T05:24:27Z | |
dc.date.issued | 2003 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7807 | |
dc.source | IIOimport | |
dc.title | A comparison of spike, flash, SPER and laser annealing for 45nm CMOS | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Pawlak, Bartek | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.contributor.imecauthor | Lauwers, Anne | |
dc.contributor.imecauthor | Maex, Karen | |
dc.source.peerreview | no | |
dc.source.beginpage | 261 | |
dc.source.endpage | 266 | |
dc.source.conference | CMOS Front-End Materials and Process Technology | |
dc.source.conferencedate | 21/04/2003 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - imec | |
imec.internalnotes | MRS Symposium Proceedings; Vol. 765 | |