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Design-driven optimisation of a 90 nm RF CMOS process by use of elevated source/drain

dc.contributor.authorLinten, Dimitri
dc.contributor.authorThijs, Steven
dc.contributor.authorJeamsaksiri, Wutthinan
dc.contributor.authorMahadeva Iyer, Natarajan
dc.contributor.authorDe Heyn, Vincent
dc.contributor.authorVassilev, Vesselin
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorScholten, A.J.
dc.contributor.authorBadenes, G.
dc.contributor.authorJurczak, Gosia
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorDonnay, Stephane
dc.contributor.authorWambacq, Piet
dc.date.accessioned2021-10-15T05:25:08Z
dc.date.available2021-10-15T05:25:08Z
dc.date.issued2003-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7810
dc.sourceIIOimport
dc.titleDesign-driven optimisation of a 90 nm RF CMOS process by use of elevated source/drain
dc.typeProceedings paper
dc.contributor.imecauthorLinten, Dimitri
dc.contributor.imecauthorThijs, Steven
dc.contributor.imecauthorDe Heyn, Vincent
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorDonnay, Stephane
dc.contributor.imecauthorWambacq, Piet
dc.contributor.orcidimecLinten, Dimitri::0000-0001-8434-1838
dc.contributor.orcidimecThijs, Steven::0000-0003-2889-8345
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.contributor.orcidimecDonnay, Stephane::0000-0003-2489-4793
dc.contributor.orcidimecWambacq, Piet::0000-0003-4388-7257
dc.source.peerreviewno
dc.source.beginpage43
dc.source.endpage46
dc.source.conference33rd European Solid-State Devices Research Conference - ESSDERC
dc.source.conferencedate16/09/2003
dc.source.conferencelocationEstoril Portugal
imec.availabilityPublished - imec


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