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Resist reflow for 193-nm low-K1 lithography contacts

dc.contributor.authorMontgomery, P.K.
dc.contributor.authorLucas, K.
dc.contributor.authorStrozewski, K.J.
dc.contributor.authorZavyalova, L.
dc.contributor.authorGrozev, Grozdan
dc.contributor.authorReybrouck, Mario
dc.contributor.authorTzviatkov, P.
dc.contributor.authorMaenhoudt, Mireille
dc.date.accessioned2021-10-15T05:46:36Z
dc.date.available2021-10-15T05:46:36Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7911
dc.sourceIIOimport
dc.titleResist reflow for 193-nm low-K1 lithography contacts
dc.typeProceedings paper
dc.contributor.imecauthorGrozev, Grozdan
dc.contributor.imecauthorReybrouck, Mario
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage807
dc.source.endpage816
dc.source.conferenceAdvances in Resist Technology an Processing XX
dc.source.conferencedate23/02/2003
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5039


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