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Quantification of line-edge roughness of photoresists. I: A comparison between off-line and on-line analysis of top-down scanning electron microscopy images

dc.contributor.authorPatsis, G.P.
dc.contributor.authorConstantoudis, V.
dc.contributor.authorTserepi, A.
dc.contributor.authorGogolides, E.
dc.contributor.authorGrozev, Grozdan
dc.date.accessioned2021-10-15T06:02:47Z
dc.date.available2021-10-15T06:02:47Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7984
dc.sourceIIOimport
dc.titleQuantification of line-edge roughness of photoresists. I: A comparison between off-line and on-line analysis of top-down scanning electron microscopy images
dc.typeJournal article
dc.contributor.imecauthorGrozev, Grozdan
dc.source.peerreviewno
dc.source.beginpage1008
dc.source.endpage1018
dc.source.journalJournal of Vacuum Science & Technology B
dc.source.issue3
dc.source.volume21
imec.availabilityPublished - imec


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