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Printability study for phase-shift masks at 193nm lithography

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-10-15T06:07:50Z
dc.date.available2021-10-15T06:07:50Z
dc.date.issued2003-01
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8006
dc.sourceIIOimport
dc.titlePrintability study for phase-shift masks at 193nm lithography
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage79
dc.source.endpage89
dc.source.conference19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
dc.source.conferencedate13/01/2003
dc.source.conferencelocationSonthofen Duitsland
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5148


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