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Printability of 2D mask quality

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-10-15T06:08:03Z
dc.date.available2021-10-15T06:08:03Z
dc.date.issued2003-12
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8007
dc.sourceIIOimport
dc.titlePrintability of 2D mask quality
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage276
dc.source.endpage286
dc.source.conference23rd Annual BACUS Symposium on Photomask Technology
dc.source.conferencedate8/09/2003
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5256


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