Show simple item record

Analysis of oxygen thermal donor formation in n-type CZ silicon

dc.contributor.authorRafi, Joan Marc
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.contributor.authorUlyashin, A.G.
dc.contributor.authorJob, R.
dc.contributor.authorFahrner, W.R.
dc.contributor.authorVersluys, J.
dc.contributor.authorClauws, P.
dc.contributor.authorLozano, M.
dc.contributor.authorCampabadal, F.
dc.date.accessioned2021-10-15T06:19:00Z
dc.date.available2021-10-15T06:19:00Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8055
dc.sourceIIOimport
dc.titleAnalysis of oxygen thermal donor formation in n-type CZ silicon
dc.typeProceedings paper
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage96
dc.source.endpage105
dc.source.conferenceAnalytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes
dc.source.conferencedate28/04/2003
dc.source.conferencelocationParis France
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 2003-03


Files in this item

Thumbnail
Name:
7279.pdf
Size:
438.5Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record