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Status 157nm lithography development at IMEC

dc.contributor.authorRonse, Kurt
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorEliat, Astrid
dc.contributor.authorGoethals, Mieke
dc.contributor.authorHermans, Jan
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorBeckx, Stephan
dc.contributor.authorWouters, Jan
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorO'Neil, Timothy
dc.contributor.authorTirri, Bruce
dc.contributor.authorSewell, Harry
dc.date.accessioned2021-10-15T06:25:06Z
dc.date.available2021-10-15T06:25:06Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8081
dc.sourceIIOimport
dc.titleStatus 157nm lithography development at IMEC
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorWouters, Jan
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage640
dc.source.endpage649
dc.source.conferenceOptical Microlithography XVI
dc.source.conferencedate23/02/2003
dc.source.conferencelocationSanta CLara, CA usa
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 5040


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