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Spatial characterization of the local charge-distribution in silicon-rich-oxide channel-hot-electron injection based non-volatile memory cells using the charge pumping technique

dc.contributor.authorRosmeulen, Maarten
dc.contributor.authorCrupi, Isodiana
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-15T06:26:45Z
dc.date.available2021-10-15T06:26:45Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8088
dc.sourceIIOimport
dc.titleSpatial characterization of the local charge-distribution in silicon-rich-oxide channel-hot-electron injection based non-volatile memory cells using the charge pumping technique
dc.typeProceedings paper
dc.contributor.imecauthorRosmeulen, Maarten
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecRosmeulen, Maarten::0000-0002-3663-7439
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.source.peerreviewno
dc.source.beginpage81
dc.source.endpage82
dc.source.conference19th IEEE Nonvolatile Semiconductor Memory Workshop - NVSMW
dc.source.conferencedate16/02/2003
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec


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