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Barrier studies on porous silk semiconductor dielectric

dc.contributor.authorTokei, Zsolt
dc.contributor.authorIacopi, Francesca
dc.contributor.authorRichard, Olivier
dc.contributor.authorWaeterloos, Joost
dc.contributor.authorRozeveld, S.
dc.contributor.authorBeach, E.
dc.contributor.authorMebarki, Bencherki
dc.contributor.authorMandrekar, T.
dc.contributor.authorGuggilla, S.
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T06:59:23Z
dc.date.available2021-10-15T06:59:23Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8218
dc.sourceIIOimport
dc.titleBarrier studies on porous silk semiconductor dielectric
dc.typeJournal article
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewyes
dc.source.beginpage352
dc.source.endpage357
dc.source.journalMicroelectronic Engineering
dc.source.issue2_4
dc.source.volume70
imec.availabilityPublished - imec
imec.internalnotesMaterials for Advanced Metallization 2003


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