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Attenuated phase shift maks using MoSi as an opaque layer

dc.contributor.authorPopa, Ovidiu
dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-09-29T13:15:46Z
dc.date.available2021-09-29T13:15:46Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/825
dc.sourceIIOimport
dc.titleAttenuated phase shift maks using MoSi as an opaque layer
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage171
dc.source.endpage4
dc.source.conference18th International Semiconductor Conference. CAS'95 Proceedings
dc.source.conferencedate10/10/1995
dc.source.conferencelocationSinaia Romania
imec.availabilityPublished - open access


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