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Lithography options for sub -90nm imaging "status 157nm lithography"

dc.contributor.authorVan den hove, Luc
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-15T07:10:34Z
dc.date.available2021-10-15T07:10:34Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8261
dc.sourceIIOimport
dc.titleLithography options for sub -90nm imaging "status 157nm lithography"
dc.typeOral presentation
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.conferenceInternational Forum on Semiconductor Technology
dc.source.conferencedate13/02/2003
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec


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