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dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBrijs, Bert
dc.contributor.authorBender, Hugo
dc.contributor.authorConard, Thierry
dc.contributor.authorPetry, Jasmine
dc.contributor.authorRichard, Olivier
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDelabie, Annelies
dc.contributor.authorCaymax, Matty
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-15T07:26:13Z
dc.date.available2021-10-15T07:26:13Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8320
dc.sourceIIOimport
dc.titlePhysical characterization of ultrathin high k dielectrics
dc.typeProceedings paper
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage23
dc.source.endpage33
dc.source.conferenceNovel Materials and Processes for Advanced CMOS
dc.source.conferencedate2/12/2002
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 745


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