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Limitations and concerns in the sheet resistance measurement of ultra-shallow dopant profiles

dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorClarysse, Trudo
dc.contributor.authorLoo, Roger
dc.contributor.authorPawlak, Bartek
dc.date.accessioned2021-10-15T07:27:25Z
dc.date.available2021-10-15T07:27:25Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8324
dc.sourceIIOimport
dc.titleLimitations and concerns in the sheet resistance measurement of ultra-shallow dopant profiles
dc.typeMeeting abstract
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.beginpage187
dc.source.conferenceUltra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
dc.source.conferencedate27/04/2003
dc.source.conferencelocationSanta Cruz, CA USA
imec.availabilityPublished - imec


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