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dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorJanssens, Tom
dc.contributor.authorFruehauf, Jens
dc.contributor.authorRoss, I.M.
dc.contributor.authorCullis, A.
dc.contributor.authorVandenberg, J.A.
dc.contributor.authorBergmaier, A.
dc.contributor.authorDollinger, G.
dc.date.accessioned2021-10-15T07:29:02Z
dc.date.available2021-10-15T07:29:02Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8330
dc.sourceIIOimport
dc.titleAssessment of the near-surface profiling capabilities of SIMS
dc.typeMeeting abstract
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage165
dc.source.conferenceUltra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
dc.source.conferencedate27/04/2003
dc.source.conferencelocationSanta Cruz, CA USA
imec.availabilityPublished - imec
imec.internalnotesAbstract only


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