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Development of a contact edge roughness measurement methodology and its sources in 193nm patterning

dc.contributor.authorVandeweyer, Tom
dc.contributor.authorMaerhoudt,
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorDirksen, Peter
dc.date.accessioned2021-10-15T07:30:44Z
dc.date.available2021-10-15T07:30:44Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8336
dc.sourceIIOimport
dc.titleDevelopment of a contact edge roughness measurement methodology and its sources in 193nm patterning
dc.typeProceedings paper
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.source.peerreviewno
dc.source.conferenceInterface '03
dc.source.conferencedate22/09/2003
dc.source.conferencelocationSan Diego, Ca USA
imec.availabilityPublished - imec


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