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Anisotropic etching of silicon in a two-component alkaline solution

dc.contributor.authorVazsonyi, E.
dc.contributor.authorVertesy, Z.
dc.contributor.authorToth, A.
dc.contributor.authorSzlufcik, Jozef
dc.date.accessioned2021-10-15T07:35:06Z
dc.date.available2021-10-15T07:35:06Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8352
dc.sourceIIOimport
dc.titleAnisotropic etching of silicon in a two-component alkaline solution
dc.typeJournal article
dc.contributor.imecauthorSzlufcik, Jozef
dc.source.peerreviewno
dc.source.beginpage165
dc.source.endpage169
dc.source.journalJournal of Micromechanics and Microengineering
dc.source.issue2
dc.source.volume13
imec.availabilityPublished - imec


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