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Evaluation of megasonic cleaning systems for particle removal efficiency and damaging

dc.contributor.authorVereecke, Guy
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorVeltens, J.
dc.contributor.authorLux, Marcel
dc.contributor.authorArnauts, Sophia
dc.contributor.authorKenis, Karine
dc.contributor.authorVos, Rita
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T07:38:22Z
dc.date.available2021-10-15T07:38:22Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8364
dc.sourceIIOimport
dc.titleEvaluation of megasonic cleaning systems for particle removal efficiency and damaging
dc.typeMeeting abstract
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewno
dc.source.conference204th Meeting of the Electrochemical Society: 8th Int. Symp. on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate13/10/2003
dc.source.conferencelocationOrlando, Fl USA
imec.availabilityPublished - imec
imec.internalnotesAbstract 778


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