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CD Control: The limiting factor for i-line and deep-UV lithography?

dc.contributor.authorRonse, Kurt
dc.contributor.authorPforr, Rainer
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-29T13:15:56Z
dc.date.available2021-09-29T13:15:56Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/839
dc.sourceIIOimport
dc.titleCD Control: The limiting factor for i-line and deep-UV lithography?
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage241
dc.source.endpage254
dc.source.conferenceProceedings of the Microlithography Seminar - INTERFACE'95
dc.source.conferencedate29/10/1995
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - open access


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