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Arf solutions for low-k1 back-end imaging

dc.contributor.authorWiaux, Vincent
dc.contributor.authorMontgomery, Patrick
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorMonnoyer, Philippe
dc.contributor.authorRonse, Kurt
dc.contributor.authorConley,
dc.contributor.authorLitt,
dc.contributor.authorLucas,
dc.contributor.authorFinders, Jo
dc.contributor.authorSocha,
dc.contributor.authorVan Den Broeke,
dc.date.accessioned2021-10-15T07:48:07Z
dc.date.available2021-10-15T07:48:07Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8400
dc.sourceIIOimport
dc.titleArf solutions for low-k1 back-end imaging
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage270
dc.source.endpage281
dc.source.conferenceOptical Microlithography XVI
dc.source.conferencedate23/02/2003
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol.5040


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