dc.contributor.author | Xu, Kaidong | |
dc.contributor.author | Vos, Rita | |
dc.contributor.author | Vereecke, Guy | |
dc.contributor.author | Lux, Marcel | |
dc.contributor.author | Fyen, Wim | |
dc.contributor.author | Holsteyns, Frank | |
dc.contributor.author | Kenis, Karine | |
dc.contributor.author | Mertens, Paul | |
dc.contributor.author | Heyns, Marc | |
dc.contributor.author | Vinckier, Chris | |
dc.date.accessioned | 2021-10-15T07:52:10Z | |
dc.date.available | 2021-10-15T07:52:10Z | |
dc.date.issued | 2003 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8415 | |
dc.source | IIOimport | |
dc.title | Relation between particle density and haze on a wafer: a new approach to measuring nano-sized particles | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Vos, Rita | |
dc.contributor.imecauthor | Vereecke, Guy | |
dc.contributor.imecauthor | Lux, Marcel | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.imecauthor | Kenis, Karine | |
dc.contributor.imecauthor | Mertens, Paul | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | Vereecke, Guy::0000-0001-9058-9338 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 161 | |
dc.source.endpage | 165 | |
dc.source.conference | Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS | |
dc.source.conferencedate | 16/09/2002 | |
dc.source.conferencelocation | Oostende Belgium | |
imec.availability | Published - open access | |
imec.internalnotes | Solid-State Phenomena; Vol. 92 | |