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Thermal stability of high k layers

dc.contributor.authorZhao, Chao
dc.contributor.authorCosnier, V.
dc.contributor.authorChen, P.J.
dc.contributor.authorRichard, Olivier
dc.contributor.authorRoebben, G.
dc.contributor.authorMaes, Jan
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorBender, Hugo
dc.contributor.authorYoung, Edward
dc.contributor.authorVan der Biest, O.
dc.contributor.authorCaymax, Matty
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T07:59:14Z
dc.date.available2021-10-15T07:59:14Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8439
dc.sourceIIOimport
dc.titleThermal stability of high k layers
dc.typeProceedings paper
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage9
dc.source.endpage14
dc.source.conferenceNovel Materials and Processes for Advanced CMOS
dc.source.conferencedate2/12/2002
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 745


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