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Modeling for profile-based process window metrology

dc.contributor.authorAusschnitt, C.P.
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-15T12:39:33Z
dc.date.available2021-10-15T12:39:33Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8501
dc.sourceIIOimport
dc.titleModeling for profile-based process window metrology
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.beginpage38
dc.source.endpage47
dc.source.conferenceData Analysis and Modeling for Process Control
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 5378


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