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The impact of backside particles on the limits of optical lithography

dc.contributor.authorBearda, Twan
dc.contributor.authorMertens, Paul
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorCompen, R.
dc.contributor.authorvan Meer, R.
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-15T12:41:30Z
dc.date.available2021-10-15T12:41:30Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8547
dc.sourceIIOimport
dc.titleThe impact of backside particles on the limits of optical lithography
dc.typeOral presentation
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorHeyns, Marc
dc.source.peerreviewno
dc.source.conference7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - imec


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