High-k materials for tunnel barrier engineering in future memory technologies

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Authors
Blomme, Pieter; Govoreanu, Bogdan; Rosmeulen, Maarten; Akheyar, Amal; Haspeslagh, Luc; De Vos, Joeri; Lorenzini, Martino; Van Houdt, Jan; De Meyer, Kristin
Conference
Extended Abstracts 206th Electrochemical Society Meeting
Title
High-k materials for tunnel barrier engineering in future memory technologies
Publication type
Meeting abstract
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