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Cesium/xenon dual beam depth profiling with TOF-SIMS: measurement and modeling of M+, MCs+, and M2Cs2+ yields

dc.contributor.authorBrison, J.
dc.contributor.authorConard, Thierry
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHoussiau, L.
dc.date.accessioned2021-10-15T12:47:52Z
dc.date.available2021-10-15T12:47:52Z
dc.date.issued2004-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8638
dc.sourceIIOimport
dc.titleCesium/xenon dual beam depth profiling with TOF-SIMS: measurement and modeling of M+, MCs+, and M2Cs2+ yields
dc.typeProceedings paper
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewno
dc.source.beginpage749
dc.source.endpage753
dc.source.conferenceProceedings of the 14th Int. Conference on Secondary Ion Mass Spectrometry and Related Topics - SIMS XIV
dc.source.conferencedate14/09/2003
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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