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Charge trapping in SiO2/HfO2 dual layer gate stacks

dc.contributor.authorCartier, E.
dc.contributor.authorKerber, A.
dc.contributor.authorPantisano, Luigi
dc.date.accessioned2021-10-15T12:49:52Z
dc.date.available2021-10-15T12:49:52Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8660
dc.sourceIIOimport
dc.titleCharge trapping in SiO2/HfO2 dual layer gate stacks
dc.typeProceedings paper
dc.source.peerreviewno
dc.source.beginpage105
dc.source.endpage110
dc.source.conferenceExtended Abstracts of the 9th Workshop on Formation, Characterization and Reliability of Ultrathin Oxides
dc.source.conferencedate23/01/2004
dc.source.conferencelocationAtagawa Heights Japan
imec.availabilityPublished - imec


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