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Defect behavior and control in advanced CMOS process technologies

dc.contributor.authorClaeys, Cor
dc.contributor.authorSimoen, Eddy
dc.date.accessioned2021-10-15T12:53:17Z
dc.date.available2021-10-15T12:53:17Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8692
dc.sourceIIOimport
dc.titleDefect behavior and control in advanced CMOS process technologies
dc.typeProceedings paper
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage50
dc.source.endpage65
dc.source.conferenceAdvanced Short-Time Thermal Processing for Si-Based CMOS Devices II
dc.source.conferencedate9/05/2004
dc.source.conferencelocationSan Antonio, TX USA
imec.availabilityPublished - open access
imec.internalnotesElectrochemical Society Proceedings; Vol. 2004-01


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