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Accurate electrical activation characterization of CMOS ultra-shallow profiles

dc.contributor.authorClarysse, Trudo
dc.contributor.authorDortu, Fabian
dc.contributor.authorVanhaeren, Danielle
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorGeenen, Luc
dc.contributor.authorJanssens, Tom
dc.contributor.authorLoo, Roger
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorPawlak, Bartek
dc.contributor.authorOuzeaud, V.
dc.contributor.authorDefranoux, C.
dc.contributor.authorFaifer, V.N.
dc.contributor.authorCurrent, M.I.
dc.date.accessioned2021-10-15T12:53:44Z
dc.date.available2021-10-15T12:53:44Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8696
dc.sourceIIOimport
dc.titleAccurate electrical activation characterization of CMOS ultra-shallow profiles
dc.typeJournal article
dc.contributor.imecauthorVanhaeren, Danielle
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.orcidimecVanhaeren, Danielle::0000-0001-8624-9533
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.beginpage166
dc.source.endpage173
dc.source.journalMaterials Science and Engineering B
dc.source.volume114-115
imec.availabilityPublished - imec
imec.internalnotesE-MRS Spring Meeting Symposium B: Materials Science Issues in Advanced CMOS Source-Drain Engineering; Strasbourg; May 2004


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