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Initial assessment of the impact of a hard pellicle on imaging using a 193 nm step-and-scan system

dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorKocsis, Michael
dc.contributor.authorBruls, R.
dc.contributor.authorVan Peski, C.
dc.contributor.authorGrenville, A.
dc.date.accessioned2021-10-15T13:00:32Z
dc.date.available2021-10-15T13:00:32Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8751
dc.sourceIIOimport
dc.titleInitial assessment of the impact of a hard pellicle on imaging using a 193 nm step-and-scan system
dc.typeJournal article
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorKocsis, Michael
dc.source.peerreviewno
dc.source.beginpage239
dc.source.endpage262
dc.source.journalJournal of Microlithography, Microfabrication and Microsystems
dc.source.issue2
dc.source.volume3
imec.availabilityPublished - imec


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