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On the defect generation and low voltage extrapolation of QBD in SiO2/HfO2 stacks

dc.contributor.authorDegraeve, Robin
dc.contributor.authorCrupi, F.
dc.contributor.authorKwak, Dong Hwa
dc.contributor.authorGroeseneken, Guido
dc.date.accessioned2021-10-15T13:10:03Z
dc.date.available2021-10-15T13:10:03Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8817
dc.sourceIIOimport
dc.titleOn the defect generation and low voltage extrapolation of QBD in SiO2/HfO2 stacks
dc.typeProceedings paper
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorGroeseneken, Guido
dc.source.peerreviewno
dc.source.beginpage140
dc.source.endpage141
dc.source.conferenceTechnical Digest VLSI Technology Symposium
dc.source.conferencedate15/06/2004
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - imec


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