Influence of processing conditions on CoSi2 formation in the presence of a Ti capping layer

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Authors

Detavernier, C.; Van Meirhaeghe, R.L.; Vandervorst, Wilfried; Maex, Karen

Issue

3_4

Journal

Microelectronic Engineering

Volume

71

Title

Influence of processing conditions on CoSi2 formation in the presence of a Ti capping layer

Publication type

Journal article

Embargo date

9999-12-31

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