HfO2 high-k gate dielectrics on germanium by molecular beam deposition

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Authors
Dimoulas, G.; Mavrou, G.; Vellianitis, G.; Evangelou, E.; Boukos, N.; Travlos, A.; Houssa, Michel; Caymax, Matty
Conference
Semiconductor Interface Specialists Conference
Title
HfO2 high-k gate dielectrics on germanium by molecular beam deposition
Publication type
Oral presentation
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