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A 65-nm node SRAM solution using alt-PSM with ArF lithography

dc.contributor.authorDriessen, Frank
dc.contributor.authorZawadzki, Mary T.
dc.contributor.authorKrishnan, Prakash R.
dc.contributor.authorBalasinski, Artur
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-15T13:17:14Z
dc.date.available2021-10-15T13:17:14Z
dc.date.issued2004-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8862
dc.sourceIIOimport
dc.titleA 65-nm node SRAM solution using alt-PSM with ArF lithography
dc.typeProceedings paper
dc.contributor.imecauthorVandenberghe, Geert
dc.source.peerreviewno
dc.source.beginpage224
dc.source.endpage234
dc.source.conferenceDesign and Process Integration for Microelectronic Manufacturing II
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec
imec.internalnotesProc. SPIE, Vol. 5379


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