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Multivariate analysis of a 100-nm process measured by in-line scatterometry

dc.contributor.authorEgret, S.
dc.contributor.authorFurusho, Tetsunari
dc.contributor.authorBaudemprez, Bart
dc.date.accessioned2021-10-15T13:19:32Z
dc.date.available2021-10-15T13:19:32Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8875
dc.sourceIIOimport
dc.titleMultivariate analysis of a 100-nm process measured by in-line scatterometry
dc.typeProceedings paper
dc.contributor.imecauthorBaudemprez, Bart
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage296
dc.source.endpage306
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XVIII
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 5375


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