Show simple item record

Effects of different processing conditions on line edge roughness for 193-nm and 157-nm resists

dc.contributor.authorErcken, Monique
dc.contributor.authorLeunissen, Peter
dc.contributor.authorPollentier, Ivan
dc.contributor.authorPatsis, G.
dc.contributor.authorConstantoudis, V.
dc.contributor.authorGogolides, Evangelos
dc.date.accessioned2021-10-15T13:21:54Z
dc.date.available2021-10-15T13:21:54Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8888
dc.sourceIIOimport
dc.titleEffects of different processing conditions on line edge roughness for 193-nm and 157-nm resists
dc.typeProceedings paper
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.source.peerreviewno
dc.source.beginpage266
dc.source.endpage275
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XVIII
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara (CA) USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE, vol. 5375


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record