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Rapid thermal oxidation of heavily doped silicon for advanced solar cell processing

dc.contributor.authorSivoththaman, Sivanarayanamoorthy
dc.contributor.authorLaureys, Wim
dc.contributor.authorNijs, Johan
dc.contributor.authorMertens, Robert
dc.date.accessioned2021-09-29T13:16:57Z
dc.date.available2021-09-29T13:16:57Z
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/888
dc.sourceIIOimport
dc.titleRapid thermal oxidation of heavily doped silicon for advanced solar cell processing
dc.typeProceedings paper
dc.contributor.imecauthorMertens, Robert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage259
dc.source.endpage264
dc.source.conferenceRapid Thermal and Integrated Processing IV
dc.source.conferencedate17/04/1995
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 387


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