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Experimental verification of a model based decomposition method for double dipole lithography

dc.contributor.authorEurlings, M.
dc.contributor.authorHsu, S.D.
dc.contributor.authorHendrickx, Eric
dc.contributor.authorop 't Root, W.
dc.contributor.authorLaidig, T.L.
dc.contributor.authorChiou, T.B.
dc.contributor.authorChen, A.
dc.contributor.authorChen, F.
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorFinders, J.
dc.date.accessioned2021-10-15T13:22:47Z
dc.date.available2021-10-15T13:22:47Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8893
dc.sourceIIOimport
dc.titleExperimental verification of a model based decomposition method for double dipole lithography
dc.typeProceedings paper
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandenberghe, Geert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1225
dc.source.endpage1236
dc.source.conferenceOptical Microlithography XVII
dc.source.conferencedate22/02/2004
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; vol. 5377


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