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A detailed study of semiconductor wafer drying

dc.contributor.authorFyen, Wim
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorBearda, Twan
dc.contributor.authorArnauts, Sophia
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorDoumen, Geert
dc.contributor.authorKenis, Karine
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-15T13:29:45Z
dc.date.available2021-10-15T13:29:45Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8933
dc.sourceIIOimport
dc.titleA detailed study of semiconductor wafer drying
dc.typeOral presentation
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.source.peerreviewno
dc.source.conferenceParticles on Surfaces 8
dc.source.conferencedate16/06/2004
dc.source.conferencelocationPhiladelphia, PA USA
imec.availabilityPublished - imec


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