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Imaging of H2 bubbles and the related strain field in silicon wafers exposed to RF hydrogen plasma

dc.contributor.authorGhica, C.
dc.contributor.authorNistor, L.
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorUlyashin, Aliaksandr
dc.contributor.authorVan Tendeloo, G.
dc.date.accessioned2021-10-15T13:35:10Z
dc.date.available2021-10-15T13:35:10Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8960
dc.sourceIIOimport
dc.titleImaging of H2 bubbles and the related strain field in silicon wafers exposed to RF hydrogen plasma
dc.typeProceedings paper
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage395
dc.source.endpage396
dc.source.conferenceProceedings of the 13th European Microscopy Congress. Volume 2: Materials Sciences
dc.source.conferencedate22/08/2004
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access


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