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157nm resist process performance and integration challenges on a full field scanner

dc.contributor.authorGoethals, Mieke
dc.contributor.authorGronheid, Roel
dc.contributor.authorList, Scott
dc.contributor.authorErcken, Monique
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-15T13:36:09Z
dc.date.available2021-10-15T13:36:09Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8965
dc.sourceIIOimport
dc.title157nm resist process performance and integration challenges on a full field scanner
dc.typeJournal article
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage655
dc.source.endpage674
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue4
dc.source.volume17
imec.availabilityPublished - imec
imec.internalnotesPaper from the 21st Conf. on Photopolymer Science and Technology; June 2004; Chiba, Japan


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