Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
157nm resist process performance and integration challenges on a full field scanner
Publication:
157nm resist process performance and integration challenges on a full field scanner
Copy permalink
Date
2004
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Goethals, Mieke
;
Gronheid, Roel
;
List, Scott
;
Ercken, Monique
;
Van Roey, Frieda
;
Van Den Heuvel, Dieter
;
Locorotondo, Sabrina
;
Ronse, Kurt
Journal
Journal of Photopolymer Science and Technology
Abstract
Description
Metrics
Views
2025
since deposited on 2021-10-15
1
last month
Acq. date: 2025-12-10
Citations
Metrics
Views
2025
since deposited on 2021-10-15
1
last month
Acq. date: 2025-12-10
Citations