157nm resist process performance and integration challenges on a full field scanner

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Authors

Goethals, Mieke; Gronheid, Roel; List, Scott; Ercken, Monique; Van Roey, Frieda; Van Den Heuvel, Dieter; Locorotondo, Sabrina; Ronse, Kurt

Issue

4

Journal

Journal of Photopolymer Science and Technology

Volume

17

Title

157nm resist process performance and integration challenges on a full field scanner

Publication type

Journal article

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