Publication:
157nm resist process performance and integration challenges on a full field scanner
Date
| dc.contributor.author | Goethals, Mieke | |
| dc.contributor.author | Gronheid, Roel | |
| dc.contributor.author | List, Scott | |
| dc.contributor.author | Ercken, Monique | |
| dc.contributor.author | Van Roey, Frieda | |
| dc.contributor.author | Van Den Heuvel, Dieter | |
| dc.contributor.author | Locorotondo, Sabrina | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.imecauthor | Gronheid, Roel | |
| dc.contributor.imecauthor | Ercken, Monique | |
| dc.contributor.imecauthor | Van Roey, Frieda | |
| dc.contributor.imecauthor | Van Den Heuvel, Dieter | |
| dc.contributor.imecauthor | Locorotondo, Sabrina | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-10-15T13:36:09Z | |
| dc.date.available | 2021-10-15T13:36:09Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8965 | |
| dc.source.beginpage | 655 | |
| dc.source.endpage | 674 | |
| dc.source.issue | 4 | |
| dc.source.journal | Journal of Photopolymer Science and Technology | |
| dc.source.volume | 17 | |
| dc.title | 157nm resist process performance and integration challenges on a full field scanner | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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