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Articles
157nm resist process performance and integration challenges on a full field scanner
Publication:
157nm resist process performance and integration challenges on a full field scanner
Date
2004
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Goethals, Mieke
;
Gronheid, Roel
;
List, Scott
;
Ercken, Monique
;
Van Roey, Frieda
;
Van Den Heuvel, Dieter
;
Locorotondo, Sabrina
;
Ronse, Kurt
Journal
Journal of Photopolymer Science and Technology
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2023
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
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Views
2023
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations