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dc.contributor.authorGromova, Maria
dc.contributor.authorBaert, Kris
dc.contributor.authorVan Hoof, Chris
dc.contributor.authorMehta, A.
dc.contributor.authorWitvrouw, Ann
dc.date.accessioned2021-10-15T13:40:17Z
dc.date.available2021-10-15T13:40:17Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8986
dc.sourceIIOimport
dc.titleThe novel use of low temperature hydrogenated microcrystalline silicon germanium (µcSiGe:H) for MEMS applications
dc.typeJournal article
dc.contributor.imecauthorVan Hoof, Chris
dc.contributor.orcidimecVan Hoof, Chris::0000-0002-4645-3326
dc.source.peerreviewno
dc.source.beginpage266
dc.source.endpage271
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume76
imec.availabilityPublished - imec
imec.internalnotesMaterials for Advanced Metallization; Brussels; March 2004


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