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Resist evaluation using EUV interference lithography

dc.contributor.authorGronheid, Roel
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorGoethals, Mieke
dc.contributor.authorLeunissen, Peter
dc.contributor.authorVan Steenwinckel, David
dc.contributor.authorSolak, H.H.
dc.date.accessioned2021-10-15T13:40:29Z
dc.date.available2021-10-15T13:40:29Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8987
dc.sourceIIOimport
dc.titleResist evaluation using EUV interference lithography
dc.typeOral presentation
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVan Roey, Frieda
dc.source.peerreviewno
dc.source.conference3rd International EUVL symposium
dc.source.conferencedate1/11/2004
dc.source.conferencelocationMiyazaki Japan
imec.availabilityPublished - imec


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