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Selective sidewall airgap integration for deep submicrometer interconnects

dc.contributor.authorGueneau de Mussy, Jean Paul
dc.contributor.authorRichard, Olivier
dc.contributor.authorBeyer, Gerald
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T13:40:51Z
dc.date.available2021-10-15T13:40:51Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8989
dc.sourceIIOimport
dc.titleSelective sidewall airgap integration for deep submicrometer interconnects
dc.typeJournal article
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.beginpageG286
dc.source.endpageG289
dc.source.journalElectrochemical and Solid-State Letters
dc.source.issue11
dc.source.volume7
imec.availabilityPublished - imec


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